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Eur. Phys. J. Special Topics 169, 123-128 (2009)
DOI: 10.1140/epjst/e2009-00981-0
1 Institute for experimental physics, Hamburg University, Luruper Chaussee 149, 22761 Hamburg, Germany
2 Hamburger Synchrotron Strahlungslabor at Deutsche Elektronen Synchrotron HASYLAB/DESY, Notkestr. 85, 22607 Hamburg, Germany
alexander.foehlisch@desy.de
© EDP Sciences, Springer-Verlag 2009
DOI: 10.1140/epjst/e2009-00981-0
Towards X-ray induced transient grating methods for nanometer scale dynamics: Diffraction on transient structures induced by extreme ultraviolet radiation from FLASH
A. Föhlisch1, M. Beye1, H. Redlin2 and S. Düsterer21 Institute for experimental physics, Hamburg University, Luruper Chaussee 149, 22761 Hamburg, Germany
2 Hamburger Synchrotron Strahlungslabor at Deutsche Elektronen Synchrotron HASYLAB/DESY, Notkestr. 85, 22607 Hamburg, Germany
alexander.foehlisch@desy.de
Abstract
Using the high brilliance femtosecond soft X-ray pulses from the Free-Electron LASer at Hamburg (FLASH) the X-ray induced transient optical reflectivity change of GaAs has been established as a versatile method for femtosecond X-ray/optical cross-correlation
[1].
As the underlying physical mechanism is the X-ray induced dynamics within solids, we present in this work a feasibility study how transient grating methods could be used to study nanometer scale dynamics in materials, such as the radical diffusion parameters in photoresist materials for EUV lithography.
© EDP Sciences, Springer-Verlag 2009
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