https://doi.org/10.1140/epjst/e2008-00426-4
Thermal characterization of film-on-substrate system by photothermal method and genetic algorithm
1
Department of Physics, Zhejiang Normal University, Jinhua, 321004, P.R. China
2
Lab. of Modern Acoustics, Institute of Acoustics, Nanjing University, Nanjing, 210093, P.R. China
For a film-on-substrate system, in the case of thin films with lower thermal diffusivities compared to substrates, the phase characterization of the photothermal signals is analyzed. Moreover, the numerical estimations of multiparameter are performed, which show the feasibility of simultaneous determination of the thermal diffusivities of the film and the substrate, as well as the thermal interface resistance of the film/substrate. Because the thermal diffusivity of the thin-film and the thermal interface resistance may be highly correlated, a genetic algorithm is used as an estimation method for the determination of the thermal properties of thin films with low thermal diffusivity.
© EDP Sciences, Springer-Verlag, 2008
