https://doi.org/10.1140/epjst/e2013-01814-3
Review
Structured electrodeposition in magnetic gradient fields
1 IFW Dresden, PO Box 270016, 01171 Dresden, Germany
2 Inst. Fluid Dynamics, Technische Universität Dresden, 01062 Dresden, Germany
3 Dept. of Chemistry, Oxford University, Oxford OX1 3QZ, UK
4 Inst. Fluid Dynamics, Helmholtz-Zentrum Dresden-Rossendorf, 01314 Dresden, Germany
5 Inst. Electrochem. Electroplating, Ilmenau University of Technology, 98693 Ilmenau, Germany
a e-mail: m.uhlemann@ifw-dresden.de
Received:
17
December
2012
Revised:
5
February
2013
Published online:
26
March
2013
Electrodeposition in superimposed magnetic gradient fields is a new and promising method of structuring metal deposits while avoiding masking techniques. The magnetic properties of the ions involved, their concentrations, the electrochemical deposition parameters, and the amplitude of the applied magnetic gradient field determine the structure generated. This structure can be thicker in regions of high magnetic field gradients. It can also be free-standing or inversely structured. The complex mechanism of structured electrodeposition of metallic layers in superimposed magnetic gradient fields was studied by different experimental methods, by analytical methods and by numerical simulation and will be discussed comprehensively.
© EDP Sciences, Springer-Verlag, 2013
