https://doi.org/10.1140/epjst/e2009-00981-0
Towards X-ray induced transient grating methods for nanometer scale dynamics: Diffraction on transient structures induced by extreme ultraviolet radiation from FLASH
1
Institute for experimental physics, Hamburg University, Luruper Chaussee 149, 22761 Hamburg, Germany
2
Hamburger Synchrotron Strahlungslabor at Deutsche Elektronen Synchrotron HASYLAB/DESY, Notkestr. 85, 22607 Hamburg, Germany
Corresponding author: alexander.foehlisch@desy.de
Using the high brilliance femtosecond soft X-ray pulses from the Free-Electron LASer at Hamburg (FLASH) the X-ray induced transient optical reflectivity change of GaAs has been established as a versatile method for femtosecond X-ray/optical cross-correlation [1]. As the underlying physical mechanism is the X-ray induced dynamics within solids, we present in this work a feasibility study how transient grating methods could be used to study nanometer scale dynamics in materials, such as the radical diffusion parameters in photoresist materials for EUV lithography.
© EDP Sciences, Springer-Verlag, 2009
